Vacuum Atmosphere Tube Furnace F-VTFN203

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Vacuum Atmosphere Tube Furnace F-VTFN203

Vacuum Atmosphere Tube Furnace F-VTFN200 series is a microprocessor controlled chamber with stable PID temperature control system with a vacuum atmosphere. Equipped with a heating speed of 15 to 30 minutes from RT to 1000℃, the temperature uniformity with excellent protection of heating elements (SIC) is maintained. One press start button for pre-set programmes with alerting signal for overheating of chamber.

Tube sizeᴓ 80 x 1000
Maximum temperature1400 °C
ThermocoupleS style
Heating elementSIC
Working temperature1350 °C
Heating speed15 to 30 minutes from RT to 1000℃
Heating length300 mm
Alundum tube sizeΦ10 mm ~ 150 mm
Chamber materialAlumina ceramic fiber
Temperature precision± 1 °C
Voltage220 V
Power5 kW

High temperature SIC for heating elements

Heating speed – 15 to 30 minutes from RT to 1000?

PID controlled temperature controller with a precision of 1 °C

One button press start for pre-programmed functions

Double walled housing for high stability

Alert signal for overheating of chamber

Type S thermocouple

Heat curve can be preset with the programmable function

2 programmable groups with 16 segments in each group

Used for fusing glass, soldering, brazing, creating enamel coatings, ceramics , research centers, medical laboratories to determine the non-volatile and non-combustible proportion of the sample and for highly sophisticated metallurgical applications

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