Vacuum Atmosphere Tube Furnace F-VTFN203
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Vacuum Atmosphere Tube Furnace F-VTFN203
Vacuum Atmosphere Tube Furnace F-VTFN200 series is a microprocessor controlled chamber with stable PID temperature control system with a vacuum atmosphere. Equipped with a heating speed of 15 to 30 minutes from RT to 1000℃, the temperature uniformity with excellent protection of heating elements (SIC) is maintained. One press start button for pre-set programmes with alerting signal for overheating of chamber.
Tube size | ᴓ 80 x 1000 |
Maximum temperature | 1400 °C |
Thermocouple | S style |
Heating element | SIC |
Working temperature | 1350 °C |
Heating speed | 15 to 30 minutes from RT to 1000℃ |
Heating length | 300 mm |
Alundum tube size | Φ10 mm ~ 150 mm |
Chamber material | Alumina ceramic fiber |
Temperature precision | ± 1 °C |
Voltage | 220 V |
Power | 5 kW |
High temperature SIC for heating elements |
Heating speed – 15 to 30 minutes from RT to 1000? |
PID controlled temperature controller with a precision of 1 °C |
One button press start for pre-programmed functions |
Double walled housing for high stability |
Alert signal for overheating of chamber |
Type S thermocouple |
Heat curve can be preset with the programmable function |
2 programmable groups with 16 segments in each group |
Used for fusing glass, soldering, brazing, creating enamel coatings, ceramics , research centers, medical laboratories to determine the non-volatile and non-combustible proportion of the sample and for highly sophisticated metallurgical applications